KAISER SYSTENS E-GUN
  • KAISER SYSTENS E-GUN
  • KAISER SYSTENS E-GUN

Kaiser Systems E-GUN 1101309-2

E-GUN

The Kaiser Systems E-GUN 1101309-2 is an electron beam (e-beam) evaporation source designed for precise thin-film deposition in semiconductor manufacturing and materials research.

$500.00
Quantity
9 Items

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Kaiser Systems E-GUN 1101309-2
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Description

Manufactured by Kaiser Systems, the E-GUN 1101309-2 utilizes a focused electron beam to heat and evaporate materials, enabling controlled deposition of thin films onto substrates. This technique is essential in producing high-purity and uniform coatings for applications such as microelectronics and optical devices. The system is engineered for integration into ultra-high vacuum environments, ensuring contamination-free deposition processes. Its design emphasizes reliability and precision, catering to the stringent demands of advanced material fabrication.

Features:

  • Deposition Method: Electron beam evaporation
  • Application: Thin-film deposition for semiconductor and materials research
  • Environment: Compatible with ultra-high vacuum systems
  • Design Focus: High precision and reliability
Product Details
E-GUN
1101309-2
9 Items
New
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